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Nano-Imprint-Lithography (NIL)

Thermal UV-supported Nano-Imprint-Lithography (UV-NIL) is an easy-to-use and cost effective lithography method. It enables the repetition of Micro- and Nanometer structures in photoresist at high aspect ratios.

This approach requires an expensive I-Beam lithography only once, as the resulting structures are shaped into PDMS stamps by casting.

Prerequisites:
Constraints:
  • Stamp area 10mm by 10mm but scalable
  • Stamp material: PDMS, Sylgard 184, mixture 1:10
  • Master size 15mm x 15mm

Procedure

  • SU8 resist spin coating, film thickness in the range of 10 microns to 100 microns, using standard spin coater
  • 1. thermal curing at 65 °C for 1 min, then at 95°C for 3 min
  • Nano-Imprinting at 90°C for 2 min
  • UV exposure for 2min, 350...420nm, standard mask aligner light source
  • 2. thermal curing at 65°C for 1 min, then at 95°C for3 min
 Enlarge...
SU8-structures made by imprinting, feature size is 10 microns 
       
Silicon master
 Stamp
 Stamp unit
 Results
A. ASE etched silicon master structure  B. Casting of the stamp C. NIL
 D. Results