Thermal UV-supported Nano-Imprint-Lithography (UV-NIL) is an easy-to-use and cost effective lithography method. It enables the repetition of Micro- and Nanometer structures in photoresist at high aspect ratios.
This approach requires an expensive I-Beam lithography only once, as the resulting structures are shaped into PDMS stamps by casting.
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|A. ASE etched silicon master structure||B. Casting of the stamp||C. NIL||D. Results|